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Production requirements for 3 Phase EI Lamination with holes
Aug 04, 2018

The temperature of the 3 Phase EI Lamination with holes should not be too high or excessive during the annealing. If the operation is too high, the insulation coating will be affected or the laminate bonding will be used. The temperature of the generally oriented silicon steel sheet is about 800 degrees. The annealing temperature of the non-oriented silicon steel sheet is about 700 degrees, and the protective atmosphere in the furnace is strictly controlled to be an oxidizing atmosphere during annealing.

  

The three-phase EI silicon steel sheet with holes needs to be selected from the principle that the iron core sheet is not oxidized, the non-carburized steel and the electrical steel strip (silicon steel sheet) surface insulation coating are not significantly deteriorated. A hydrogen-nitrogen mixed gas containing 2-10% of hydrogen is used. Adding a small amount of hydrogen ensures that the core sheet does not oxidize. The dew point in the shielding gas should generally be below 0 °C.

  

In the process of making the core of the three-phase EI silicon steel sheet with holes, the products are all computer controlled during the production process, and the whole equipment is fully closed-loop monitoring the entire feeding, fastening, topping, winding and cutting. Each process is welded and completed synchronously in the rolling process. It is fast and efficient, and does not require special guards.

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